Измерение толщины естественного оксида на кремниевой рельефной шаговой структуре

Abstract

These studies were performed on a test step relief structure of mono crystalline silicon. There was experimentally measured the thickness of the natural oxide on this structure consisting of a set of elements (protrusions) with a trapezoidal profile and 2,0 μm step size, upper base about 10 nm, height about 500 nm. The tilt angle of side face with respect to the lower base was 54,7°. The entire structure was covered with a natural oxide film that appeared at room temperature, the thickness of which is being measured using a transmission electron microscope with atomic resolution by the observed pattern in the direct mode resolution of the crystal structure. In order to calibrate the measurements there was used a distance between {111} planes.